Browsing by author "Niedernostheide, F.J."
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A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications
Job, R.; Ulyashin, A.G.; Fahrner, W.R.; Niedernostheide, F.J.; Schulze, H. J.; Simoen, Eddy; Claeys, Cor; Tonelli, G. (2002) -
Low temperature doping of silicon by hydrogen plasma treatments
Job, R.; Ulyashin, A.G.; Ma, Y.; Fahrner, W.R.; Simoen, Eddy; Rafi, Joan Marc; Claeys, Cor; Niedernostheide, F.J.; Schulze, H.J. (2002)