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A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications
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A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications
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Date
2002
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Job, R.
;
Ulyashin, A.G.
;
Fahrner, W.R.
;
Niedernostheide, F.J.
;
Schulze, H. J.
;
Simoen, Eddy
;
Claeys, Cor
;
Tonelli, G.
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2008
since deposited on 2021-10-14
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last week
Acq. date: 2026-01-09
Citations
Metrics
Views
2008
since deposited on 2021-10-14
2
last month
1
last week
Acq. date: 2026-01-09
Citations