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A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications

Date

2002
Proceedings Paper
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dc.contributor.authorJob, R.
dc.contributor.authorUlyashin, A.G.
dc.contributor.authorFahrner, W.R.
dc.contributor.authorNiedernostheide, F.J.
dc.contributor.authorSchulze, H. J.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.authorTonelli, G.
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-14T21:55:51Z
dc.date.available2021-10-14T21:55:51Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6442
dc.source.beginpage405
dc.source.conferenceProceedings of the 11th International Workshop on Physics of Semiconductor Devices
dc.source.conferencedate11/12/2001
dc.source.conferencelocationDelhi India
dc.source.endpage413
dc.title

A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications

dc.typeProceedings paper
dspace.entity.typePublication
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