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A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications
Publication:
A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications
Date
2002
Proceedings Paper
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5385.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Job, R.
;
Ulyashin, A.G.
;
Fahrner, W.R.
;
Niedernostheide, F.J.
;
Schulze, H. J.
;
Simoen, Eddy
;
Claeys, Cor
;
Tonelli, G.
Journal
Abstract
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Views
1999
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1999
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations