Now showing items 1-4 of 4

    • Electron beam metrology for advanced technology nodes 

      Lorusso, Gian; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Van den Bosch, Geert; Kar, Gouri Sankar; Ohashi, Takeyoshi; Sutani, Takumichi; Watanabe, Ryota; Takemasa, Yoshikata; Ikota, Masami (2019)
    • Enabling CD SEM metrology for 5nm technology node and beyond 

      Lorusso, Gian; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnemont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru (2017)
    • Impact of annealing temperature on DSA process: toward faster assembly kinetics 

      Suh, Hyo Seon; Nair, Vineet Vijayakrishnan; Rincon Delgadillo, Paulina; Doise, Jan; Lorusso, Gian; Nealey, Paul; Monreal, Victor; Baskaran, Durairaj; Cao, Yi; Padmanaban, Munirathna; Li, Jin; Kato, Takeshi; Sutani, Takumichi; Ishimoto, Toru; Ikota, Masami; Koshihara, Shunsuke (2018)
    • LCDU and placement improvement of contacts using EUV templated DSA 

      Boeckx, Carolien; Doise, Jan; Chan, BT; Lorusso, Gian; Sutani, Takumichi; Koshihara, Shunsuke; Ishimoto, Toru; Kato, Takeshi; Rincon Delgadillo, Paulina; De Gendt, Stefan (2018)