Browsing by author "Knoll, L."
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Reduction of silicon dioxide interfacial layer to 4.6 Å EOT by Al remote scavenging in high-j/metal gate stacks on Si
Nichau, Alexander; Schafer, A.; Knoll, L.; Wirths, S.; Schram, Tom; Ragnarsson, Lars-Ake; Schubert, J.; Bernardy, P.; Luysberg, M.; Besmehn, A.; Breuer, U.; Bucca, D.; Mantl, S (2013)