Now showing items 1-2 of 2

    • Novel process to pattern selectively dual dielectric capping layers using soft-mask only 

      Schram, Tom; Kubicek, Stefan; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Shou-Zen; Chang, V.S.; Mitsuhashi, Riichiru; Okuno, Yasutoshi; Akheyar, Amal; Cho, Hag-Ju; Hooker, J.C.; Paraschiv, Vasile; Vos, Rita; Sebaai, Farid; Ercken, Monique; Kelkar, Prasad; Delabie, Annelies; Adelmann, Christoph; Witters, Thomas; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Aoulaiche, Marc; Cho, Moon Ju; Kauerauf, Thomas; De Meyer, Kristin; Lauwers, Anne; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2008)
    • Single-metal dual-dielectric (SMDD) gate-first CMOS integration towards low VT and high performance 

      Ragnarsson, Lars-Ake; Schram, Tom; Rohr, Erika; Sebaai, Farid; Kelkar, Prasad; Wada, Masayuki; Kauerauf, Thomas; Aoulaiche, Marc; Cho, Moon Ju; Kubicek, Stefan; Lauwers, Anne; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2009)