Browsing by author "Endo, Masayuki"
Now showing items 1-2 of 2
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Impact of water and top-coats on lithographic performance in 193nm immersion lithography
Kishimura, Shinji; Gronheid, Roel; Ercken, Monique; Maenhoudt, Mireille; Matsuo, Takahiro; Endo, Masayuki; Sasago, Masaru (2005) -
Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication
Yuito, Takashi; Wiaux, Vincent; Van Look, Lieve; Vandenberghe, Geert; Irie, Shigeo; Matsuo, Takahiro; Misaka, Akio; Endo, Masayuki; Sasago, Masaru (2005)