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Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication
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Authors
Yuito, Takashi
;
Wiaux, Vincent
;
Van Look, Lieve
;
Vandenberghe, Geert
;
Irie, Shigeo
;
Matsuo, Takahiro
;
Misaka, Akio
;
Endo, Masayuki
;
Sasago, Masaru
Conference
Proceedings International Microprocess and Nanotechnology Conference
Title
Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication
Publication type
Proceedings paper
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