Publication:
Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication
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1885 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-10
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Metrics
Views
1885 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-10
Citations