Publication:
Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication
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1888 since deposited on 2021-10-16
2last month
Acq. date: 2026-01-26
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Statistics
Views
1888 since deposited on 2021-10-16
2last month
Acq. date: 2026-01-26
Citations