Publication:
Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication
Date
| dc.contributor.author | Yuito, Takashi | |
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.author | Van Look, Lieve | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Irie, Shigeo | |
| dc.contributor.author | Matsuo, Takahiro | |
| dc.contributor.author | Misaka, Akio | |
| dc.contributor.author | Endo, Masayuki | |
| dc.contributor.author | Sasago, Masaru | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.contributor.imecauthor | Van Look, Lieve | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | Wiaux, Vincent::0000-0002-8923-5708 | |
| dc.date.accessioned | 2021-10-16T07:25:23Z | |
| dc.date.available | 2021-10-16T07:25:23Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11599 | |
| dc.source.beginpage | 14 | |
| dc.source.conference | Proceedings International Microprocess and Nanotechnology Conference | |
| dc.source.conferencedate | 26/10/2005 | |
| dc.source.conferencelocation | Tokyo Japan | |
| dc.source.endpage | 15 | |
| dc.title | Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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