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    • Improved low-k dielectric properties using He/H2 plasma for resist removal 

      Urbanowicz, Adam; Shamiryan, Denis; Marsik, Premysl; Travaly, Youssef; Jonas, Alain; Verdonck, Patrick; Vanstreels, Kris; Ferchichi, Abdelkarim; De Roest, David; Sprey, Hessel; Matsushita, Kiyohiro; Kaneko, Shinya; Tsuji, Naoto; Luo, Shijian; Escorcia, Orlando; Berry, Ivan; Waldfried, Carlo; De Gendt, Stefan; Baklanov, Mikhaïl (2009)