Improved low-k dielectric properties using He/H2 plasma for resist removal

Simple item page Full metadata Statistics

Author(s)

Urbanowicz, Adam

;

Shamiryan, Denis

;

Marsik, Premysl

;

Travaly, Youssef

;

;

Verdonck, Patrick

;

Vanstreels, Kris

;

Ferchichi, Abdelkarim

;

De Roest, David

;

;

Matsushita, Kiyohiro

;

;

;

;

Escorcia, Orlando

;

;

Waldfried, Carlo

;

De Gendt, Stefan

;

Baklanov, Mikhaïl

Metrics

1933 since deposited on 2021-10-18

Acq. date: 2025-10-23