Now showing items 1-2 of 2

    • A 10 μm thick poly-SiGe gyroscope processed above 0.35 μm CMOS 

      Scheurle, A.; Fuchs, T.; Kehr, K.; Leinenbach, C.; Kronmueller, S.; Arias, A.; Ceballos, J.; Lagos, M.A.; Mora, J.-M.; Munoz, J.M.; Ragel, A.; Ramos, J.; Van Aerde, Steven; Spengler, J.; Mehta, Anshu; Verbist, Agnes; Du Bois, Bert; Witvrouw, Ann (2007-01)
    • Processing of MEMS gyroscopes on top of CMOS ICs 

      Witvrouw, Ann; Mehta, Anshu; Verbist, Agnes; Du Bois, Bert; Van Aerde, Steven; Ramos-Martos, J.; Ceballos, J.; Ragel, A.; Mora, J.M.; Lagos, M.A.; Arias, A.; Hinojosa, J.M.; Spengler, J.; Leinenbach, C.; Fuchs, T.; Kronmüller, S. (2005-02)