Browsing by author "Lam, Michael"
Now showing items 1-5 of 5
-
3D Mask modeling for EUV lithography
Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012) -
EUV flare and proximity modeling and model-based correction
Zuniga, Christian D.; Habib, Mohamed; Word, James C.; Lorusso, Gian; Hendrickx, Eric; Baylav, Burak; Chalasani, Raghu; Lam, Michael (2011) -
Experimental determination and accurate modeling of the EUV ADT flare
Hendrickx, Eric; Lorusso, Gian; Fenger, Germain; Lam, Michael; Word, James (2009) -
Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration
Lorusso, Gian; Van Roey, Frieda; Hendrickx, Eric; Fenger, Germain; Lam, Michael; Christian, Zuniga; Habib, Mohamed; Diab, Hesham; Word, James (2009) -
Modeling laser bandwidth for OPC applications
Zuniga, Christian; Adam, Kostas; Lam, Michael; Lalovic, Ivan; De Bisschop, Peter (2009)