Browsing by author "Hoyer, Ronald"
Now showing items 1-4 of 4
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Acoustic cleaning in nano-electronics
Mertens, Paul; Janssens, Tom; Holsteyns, Frank; Zijlstra, Aaldert; Halder, Sandip; Wostyn, Kurt; Andreas, Michael; Hoyer, Ronald; Barbagini, Francesca; Wada, Masayuki; Franklin, Cole; Kim, Tae-Gon; Kim, K; Kenis, Karine; Le, Quoc Toan; Claes, Martine; Kesters, Els; Vos, Rita; Vereecke, Guy; Bearda, Twan; Heyns, Marc (2008) -
How much rear side polishing is required? A study on the impact of rear side polishing in PERC solar cells
Cornagliotti, Emanuele; Uruena De Castro, Angel; Horzel, Jörg; John, Joachim; Tous, Loic; Hendrickx, Dirk; Prajapati, Victor; Singh, Sukhvinder; Hoyer, Ronald; Delahaye, Franck; Weise, K.; Queisser, D.; Nussbaumer, H.; Poortmans, Jef (2012) -
Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions
Mertens, Paul; Vos, Rita; Vereecke, Guy; Janssens, Tom; Wostyn, Kurt; Claes, Martine; Kesters, Els; Le, Quoc Toan; Halder, Sandip; Hoyer, Ronald; Andreas, Michael; Kim, Kyung Hyun; Barbagini, Francesca; Zijlstra, Aaldert; Holsteyns, Frank; Kim, Tae-Gon; Kenis, Karine; Arnauts, Sophia; Lux, Marcel; Bearda, Twan; Heyns, Marc (2008) -
Ultra low concentration clean: a new approach to feol critical wafer surface cleaning
Fischer, Thomas; Puri, Suraj; Hoyer, Ronald; Wostyn, Kurt; Janssens, Tom (2007)