Now showing items 1-2 of 2

    • Lifetime test on EUV photomask with EBL2 

      Wu, Chien-ching; Bender, Markus; Jonckheere, Rik; Scholze, Frank; Bekman, Herman; van Putten, Michel; de Zanger, Rory; Ebeling, Rob; Westerhout, Jeroen; Nicolai, Kyri; van Veldhoven, Jacqueline; de Rooij-Lohmann, Veronique; Kievit, Olaf; Deutz, Alex (2019-05)
    • Study of EUV reticle storage effects through exposure on EBL2 and NXE 

      Jonckheere, Rik; Aubert, Remko; Nair, Vineet Vijayakrishnan; Hendrickx, Eric; Wu, Chien-ching; de Rooij-Lohmann, Veronique; Eslstgeest, Dorus; lenseL, Henk; Soltwich, Victor; Hoenicke, Philipp; Kolbe, Michael; Scholze, Frank (2020)