Authors

Wu, Chien-ching; Bender, Markus; Jonckheere, Rik; Scholze, Frank; Bekman, Herman; van Putten, Michel; de Zanger, Rory; Ebeling, Rob; Westerhout, Jeroen; Nicolai, Kyri; van Veldhoven, Jacqueline; de Rooij-Lohmann, Veronique; Kievit, Olaf; Deutz, Alex

Conference

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

Title

Lifetime test on EUV photomask with EBL2

Publication type

Proceedings paper