Browsing by author "Gustafsson, T."

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Improved film growth and flatband voltage control of ALD HfO2 and Hf-Al-O with n+ poly-si gates using chemical oxides and optimized post-annealing

Wilk, G. D.; Green, Martin; M.-Y., Ho; Busch, B. W.; Sorsch, T. W.; Klemens, F. P.; Brijs, Bert; van Dover, R. B.; Kornblit, A.; Gustafsson, T.; Garfunkel, E.; Hillenius, S.; Monroe, D.; Kalavade, P.; Hergenrother, J. M. (2002)
Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

Tsai, Wilman; Carter, Richard; Nohira, Hiroshi; Caymax, Matty; Conard, Thierry; Cosnier, Vincent; De Gendt, Stefan; Heyns, Marc; Petry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jan; Tuominen, M.; Schulte, W.H.; Garfunkel, E.; Gustafsson, T. (2003)