Improved film growth and flatband voltage control of ALD HfO2 and Hf-Al-O with n+ poly-si gates using chemical oxides and optimized post-annealing

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Author(s)

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van Dover, R. B.

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Hergenrother, J. M.

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2091 since deposited on 2021-10-15

Acq. date: 2025-10-23