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Improved film growth and flatband voltage control of ALD HfO2 and Hf-Al-O with n+ poly-si gates using chemical oxides and optimized post-annealing
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2093 since deposited on 2021-10-15
Acq. date: 2025-12-10
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Views
2093 since deposited on 2021-10-15
Acq. date: 2025-12-10
Citations