Browsing by author "Eliat, Astrid"
Now showing items 1-7 of 7
-
Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
Okoroanyanwu, Uzo; Stepanenko, Nickolay; Vereecke, Guy; Eliat, Astrid; Kocsis, Michael; Kang, Young-Seog; Jonckheere, Rik; Conard, Thierry; Ronse, Kurt (2004) -
Front-end-of-line process development using 193-nm lithography
Pollentier, Ivan; Ercken, Monique; Eliat, Astrid; Delvaux, Christie; Jaenen, Patrick; Ronse, Kurt (2001) -
SiON ARC: Material characterization and implication in lithographic process
Zhang, Fenghong; Pollentier, Ivan; Eliat, Astrid; Delvaux, Christie; Ronse, Kurt (2000) -
Status 157nm lithography development at IMEC
Ronse, Kurt; De Bisschop, Peter; Eliat, Astrid; Goethals, Mieke; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Jan; de Marneffe, Jean-Francois; O'Neil, Timothy; Tirri, Bruce; Sewell, Harry (2003) -
Status of 157nm Lithography Development
Jonckheere, Rik; Hermans, Jan; Goethals, Mieke; De Bisschop, Peter; Eliat, Astrid; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Johan M. D.; de Marneffe, Jean-Francois; Ronse, Kurt (2003) -
Status of UV2 Litho project : Usable Vacuum Ultra Violet Lithography
Goethals, Mieke; Jonckheere, Rik; Van Roey, Frieda; Hermans, Jan; Van Den Heuvel, Dieter; Eliat, Astrid; Gronheid, Roel; Ronse, Kurt; Wong, P.; Morton, Rob; Vasconi, M.; Severgnini, E.; Henke, W.; Hohle, C.; Henry, D.; Thony, Ph.; Schiavone, P.; Fuard, D. (2003-08) -
UV2Litho: usable vacuum ultra violet lithography
Goethals, Mieke; Jonckheere, Rik; Van Roey, F.; Hermans, J.; Eliat, Astrid; Ronse, Kurt; Wong, P.; Zandbergen, P.; Vasconi, M.; Severgnini, E.; Henke, W.; Hohle, C.; Henry, D.; Thony, P.; Markey, L.; Schiavone, P.; Fuard, D. (2002)