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Front-end-of-line process development using 193-nm lithography
Publication:
Front-end-of-line process development using 193-nm lithography
Date
2001
Proceedings Paper
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5602.pdf
2.64 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pollentier, Ivan
;
Ercken, Monique
;
Eliat, Astrid
;
Delvaux, Christie
;
Jaenen, Patrick
;
Ronse, Kurt
Journal
Abstract
Description
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2011
since deposited on 2021-10-14
437
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
2011
since deposited on 2021-10-14
437
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations