Front-end-of-line process development using 193-nm lithography

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Authors
Pollentier, Ivan; Ercken, Monique; Eliat, Astrid; Delvaux, Christie; Jaenen, Patrick; Ronse, Kurt
Conference
Lithography for Semiconductor Manufacturing II
Title
Front-end-of-line process development using 193-nm lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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