Publication:

Front-end-of-line process development using 193-nm lithography

Date

2001

Proceedings Paper

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Files

5602.pdf 2.64 MB

Author(s)

Pollentier, Ivan

;

Ercken, Monique

;

;

Delvaux, Christie

;

Jaenen, Patrick

;

Statistics

2014 since deposited on 2021-10-14

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Acq. date: 2026-02-26