Browsing by author "Otto, O."
Now showing items 1-2 of 2
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Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Pforr, Rainer; Wong, Alfred; Ronse, Kurt; Van den hove, Luc; Yen, Anthony; Palmer, S.; Fuller, G.; Otto, O. (1995) -
Optical proximity correction for 0.3 μm i-line lithography
Yen, Anthony; Tzviatkov, Plamen; Wong, Alfred; Juffermans, Casper; Jonckheere, Rik; Jaenen, Patrick; Garofalo, J.; Otto, O.; Ronse, Kurt; Van den hove, Luc (1996)