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Optical proximity correction for 0.3 μm i-line lithography
Publication:
Optical proximity correction for 0.3 μm i-line lithography
Date
1996
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yen, Anthony
;
Tzviatkov, Plamen
;
Wong, Alfred
;
Juffermans, Casper
;
Jonckheere, Rik
;
Jaenen, Patrick
;
Garofalo, J.
;
Otto, O.
;
Ronse, Kurt
;
Van den hove, Luc
Journal
Microelectronic Engineering
Abstract
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2
since deposited on 2021-09-29
Acq. date: 2025-10-24
Views
2000
since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations
Metrics
Downloads
2
since deposited on 2021-09-29
Acq. date: 2025-10-24
Views
2000
since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations