Optical proximity correction for 0.3 μm i-line lithography

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Authors

Yen, Anthony; Tzviatkov, Plamen; Wong, Alfred; Juffermans, Casper; Jonckheere, Rik; Jaenen, Patrick; Garofalo, J.; Otto, O.; Ronse, Kurt; Van den hove, Luc

Journal

Microelectronic Engineering

Volume

30

Title

Optical proximity correction for 0.3 μm i-line lithography

Publication type

Journal article

Embargo date

9999-12-31

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