Publication:

Optical proximity correction for 0.3 μm i-line lithography

Date

1996
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorYen, Anthony
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorWong, Alfred
dc.contributor.authorJuffermans, Casper
dc.contributor.authorJonckheere, Rik
dc.contributor.authorJaenen, Patrick
dc.contributor.authorGarofalo, J.
dc.contributor.authorOtto, O.
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-09-29T15:57:29Z
dc.date.available2021-09-29T15:57:29Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1680
dc.source.beginpage141
dc.source.endpage144
dc.source.journalMicroelectronic Engineering
dc.source.volume30
dc.title

Optical proximity correction for 0.3 μm i-line lithography

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
1654.pdf
Size:
406.23 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles