Authors

Pforr, Rainer; Wong, Alfred; Ronse, Kurt; Van den hove, Luc; Yen, Anthony; Palmer, S.; Fuller, G.; Otto, O.

Conference

Optical Laser Microlithography VIII

Title

Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography

Publication type

Proceedings paper

Embargo date

9999-12-31