Publication:

Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography

Date

1995
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorPforr, Rainer
dc.contributor.authorWong, Alfred
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorYen, Anthony
dc.contributor.authorPalmer, S.
dc.contributor.authorFuller, G.
dc.contributor.authorOtto, O.
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.date.accessioned2021-09-29T13:15:43Z
dc.date.available2021-09-29T13:15:43Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/821
dc.source.beginpage150
dc.source.conferenceOptical Laser Microlithography VIII
dc.source.conferencedate22/02/1995
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage170
dc.title

Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
795.pdf
Size:
1.12 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions