Browsing by author "Kirkwood, D."
Now showing items 1-3 of 3
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Characterization of low energy (2-5keV) implantation into Si
Collart, E.J.; Kirkwood, D.; Vandenberg, J.A.; Werner, M.; Vandervorst, Wilfried; Brijs, Bert; Bailey, P.; Noakes, T.C.Q. (2002) -
Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formation
Collart, E.H.; Felch, S.B.; Graoui, H.; Kirkwood, D.; Pawlak, Bartek; Absil, Philippe; Severi, Simone; Janssens, Tom; Vandervorst, Wilfried (2005) -
Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantation
Collart, E.J.H.; Kirkwood, D.; Lindsay, Richard; Vandervorst, Wilfried; Pawlak, Bartek (2004)