Browsing by author "Randall, John"
Now showing items 1-10 of 10
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Automated OPC for application in advanced lithography
Ronse, Kurt; Tritchkov, Alexander; Randall, John; Jonckheere, Rik; Ghandehari, Kouros; Van den hove, Luc (1997) -
Lithography simulation with aerial image - variable threshold resist model
Randall, John; Gangala, Hareen K; Tritchkov, Alexander (1999) -
Lithography simulation with aerial image-variable threshold resist model
Randall, John; Gangala, Hareen K; Tritchkov, Alexander (1998) -
Optically induced mask criical dimension error magnification in 248 nm lithography
Randall, John; Tritchkov, Alexander (1998) -
Proximity effects correction for advanced optical lithography processes
Tritchkov, Alexander; Finders, Jo; Randall, John; Ronse, Kurt; Van den hove, Luc (1998) -
Reduction of mask induced CD errors by optical proximity correction
Randall, John; Tritchkov, Alexander; Jonckheere, Rik; Jaenen, Patrick; Ronse, Kurt (1998) -
Some challenges for mask making to keep up with the roadmap
Jonckheere, Rik; Randall, John; Marschner, Thomas; Ronse, Kurt (1998) -
Some challenges for mask making to keep up with the roadmap
Jonckheere, Rik; Randall, John; Marschner, Thomas; Ronse, Kurt (1998) -
Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
Randall, John; Tritchkov, Alexander; Ronse, Kurt; Jaenen, Patrick (1998) -
Variable threshold resist models for lithography simulation
Randall, John; Ronse, Kurt; Marschner, Thomas; Goethals, Mieke; Ercken, Monique (1999)