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Automated OPC for application in advanced lithography
Publication:
Automated OPC for application in advanced lithography
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Date
1997
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
Tritchkov, Alexander
;
Randall, John
;
Jonckheere, Rik
;
Ghandehari, Kouros
;
Van den hove, Luc
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1965
since deposited on 2021-09-30
Acq. date: 2025-12-11
Citations
Metrics
Views
1965
since deposited on 2021-09-30
Acq. date: 2025-12-11
Citations