Browsing by author "Storms, Greet"
Now showing items 1-14 of 14
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3D Contact hole metrology accuracy and stability
Storms, Greet; Barry, Kelly; Cheng, Shaunee (2005) -
90nm technology contact CD performance characterization via ODP scatterometry
Barry, Kelly; Cheng, Shaunee; Storms, Greet (2005) -
Advanced process control for hyper-NA lithography based on CD-SEM measurement
Ishimoto, Toru; Sekiguchi, K.; Hasegawa, N.; Maeda, T.; Watanabe, K.; Storms, Greet; Laidler, David; Cheng, Shaunee (2007) -
Electrical linewidth metrology for sub-65-nm applications
Storms, Greet; Cheng, Shaunee; Pollentier, Ivan (2004) -
Integrated scatterometry for contact hole monitoring
Barry, K.; Cheng, Shaunee; Storms, Greet; Baudemprez, Bart (2004) -
Integrated scatterometry for contact hole monitoring
Cheng, Shaunee; Storms, Greet; Baudemprez, Bart; Barry, K. (2004) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Line edge roughness and its increasing importance
Ercken, Monique; Storms, Greet; Delvaux, Christie; Vandenbroeck, Nadia; Leunissen, Peter; Pollentier, Ivan (2002) -
Line edge roughness: characterization, modeling and impact on device behavior
Croon, Jeroen; Storms, Greet; Winkelmeier, Stephanie; Pollentier, Ivan; Ercken, Monique; Decoutere, Stefaan; Sansen, Willy; Maes, Herman (2002) -
Meeting double patterning challenges: from split to process control
Wiaux, Vincent; Cheng, Shaunee; Maenhoudt, Mireille; Storms, Greet; Vandenberghe, Geert; Verhaegen, Staf (2007) -
Metrology accuracy and stability: the fundamental baseline for process monitoring and control
Storms, Greet; Barry, Kelly; Cheng, Shaunee (2005) -
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Dusa, Mircea; Quaedackers, John; Larsen, Olaf F.A.; Meessen, J.; van der Heijden, Eddy; Dicker, Gerald; Wismans, Onno; de Haas, Paul; van Ingen Schenau, Koen; Finders, Jo; Vleeming, Bert; Storms, Greet; Jaenen, Patrick; Cheng, Shaunee; Maenhoudt, Mireille (2007) -
The potential of double patterning immersion lithography for the 32nm half pitch node
Wiaux, Vincent; Storms, Greet; Cheng, Shaunee; Maenhoudt, Mireille (2007-08) -
The potential of double patterning immersion lithography for the 32nm half pitch node
Wiaux, Vincent; Storms, Greet; Cheng, Shaunee; Maenhoudt, Mireille (2007-08)