Browsing by author "Bailey, George"

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Double patterning EDA solutions for the 32nm HP and beyond

Bailey, George; Tritchkov, Alexander; Park, Jea-Woo; Hong, Le; Wiaux, Vincent; Hendrickx, Eric; Verhaegen, Staf; Xie, Peng; Versluijs, Janko (2007)
Validation of immersion lithography OPC model accuracy

Estroff, Andrew; Bailey, George; Kostas, Adam; Vandenberghe, Geert; Hendrickx, Eric (2005)