Double patterning EDA solutions for the 32nm HP and beyond

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Authors
Bailey, George; Tritchkov, Alexander; Park, Jea-Woo; Hong, Le; Wiaux, Vincent; Hendrickx, Eric; Verhaegen, Staf; Xie, Peng; Versluijs, Janko
Conference
Design for Manufacturability through Design-Process Integration
Title
Double patterning EDA solutions for the 32nm HP and beyond
Publication type
Proceedings paper
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