Browsing by author "Aubuchon, Joseph"
Now showing items 1-3 of 3
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Metallization of sub- 30 nm Interconnects: Comparison of different liner/seed combinations
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Caluwaerts, Rudy; Devriendt, Katia; Altamirano Sanchez, Efrain; Wouters, Johan M. D.; Gravey, Virginie; Shah, Kavita; Luo, Qian; Sundarrajan, Arvind; Lu, Jiang; Aubuchon, Joseph; Ma, Paul; Narasimhan, Murali; Cockburn, Andrew; Tokei, Zsolt; Beyer, Gerald (2009) -
Plasma enhanced atomic layer deposition of ruthenium ultra-thin films for advanced metallization
Swerts, Johan; Armini, Silvia; Carbonell, Laure; Delabie, Annelies; Franquet, Alexis; Mertens, Sofie; Schaekers, Marc; Witters, Thomas; Tokei, Zsolt; Beyer, Gerald; Van Elshocht, Sven; Gravey, Virginie; Cockburn, Andrew; Shah, Kavita; Aubuchon, Joseph (2010) -
Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
Swerts, Johan; Armini, Silvia; Carbonell, Laure; Delabie, Annelies; Franquet, Alexis; Mertens, Sofie; Popovici, Mihaela Ioana; Schaekers, Marc; Witters, Thomas; Tokei, Zsolt; Beyer, Gerald; Van Elshocht, Sven; Gravey, Virginie; Cockburn, Andrew; Shah, Kavita; Aubuchon, Joseph (2012)