Authors

Swerts, Johan; Armini, Silvia; Carbonell, Laure; Delabie, Annelies; Franquet, Alexis; Mertens, Sofie; Popovici, Mihaela Ioana; Schaekers, Marc; Witters, Thomas; Tokei, Zsolt; Beyer, Gerald; Van Elshocht, Sven; Gravey, Virginie; Cockburn, Andrew; Shah, Kavita; Aubuchon, Joseph

ISSN

0734-2101

Issue

1

Journal

Journal of Vacuum Science and Technology A

Volume

30

Title

Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

Publication type

Journal article

Embargo date

9999-12-31