Publication:

Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

Date

2012
Journal article
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dc.contributor.authorSwerts, Johan
dc.contributor.authorArmini, Silvia
dc.contributor.authorCarbonell, Laure
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorMertens, Sofie
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSchaekers, Marc
dc.contributor.authorWitters, Thomas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorGravey, Virginie
dc.contributor.authorCockburn, Andrew
dc.contributor.authorShah, Kavita
dc.contributor.authorAubuchon, Joseph
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-20T16:38:37Z
dc.date.available2021-10-20T16:38:37Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21574
dc.identifier.urlhttp://avspublications.org/jvsta/resource/1/jvtad6/v30/i1/p01A103_s1
dc.source.beginpage01A103
dc.source.issue1
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.volume30
dc.title

Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

dc.typeJournal article
dspace.entity.typePublication
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