Browsing by author "Toublan, Olivier"
Now showing items 1-3 of 3
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LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development
Cantu, Pietro; Baldi, Livio; Piacentini, Paolo; Sytsma, Joost; Le Gratiet, Bernard; Gaugiran, Stephanie; Wong, Patrick; Miyashita, Hiroyuki; Atzei, Luisa Rita; Buch, Xavier; Verkleij, Dick; Toublan, Olivier; Perez-Murano, Francesco; Mecerreyes, David (2010) -
LENS - Lithography enhancement towards nano scale
Cantu, Pietro; Baldi, Livio; De Simone, Danilo; Piacentini, Paolo; Fliervoet, Timon; Alberga, Gerold; Le Gratiet, Bertrand; Gaugiran, Stephanie; Wong, Patrick; Miyashita, Hiroyuki; Atzei, Luisa Rita; Buch, Xavier; Verkleiji, Dick; Toublan, Olivier; Perez Murano, Francesc; Mecerreyes, David (2010) -
Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, Kevin; Montgomery, Patrick; Litt, Lloyd C.; Conley, Will; Postnikov, Sergei V.; Wu, Wei; Yuan, Chi-Min; Olivares, Marc; Strozewski, Kirk; Carter, Russell L.; Vasek, James; Smith, David; Fanucchi, Eric L.; Wiaux, Vincent; Vandenberghe, Geert; Toublan, Olivier; Verhappen, Arjan; Kuijten, Jan P.; van Wingerden, Johannes; Kasprowicz, Bryan S.; Tracy, Jeffrey W.; Progler, Christopher J.; Shiro, Eugene; Topouzov, Igor; Wimmer, Karl; Roman, Bernard J. (2003)