Browsing by author "Shiozawa, Takahiro"
Now showing items 1-3 of 3
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Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiri; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi (2017) -
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Hashimoto, Yusaku; Enomoto, Masashi; Nafus, Kathleen; Sonoda, Akihiko; Demand, Marc; Foubert, Philippe (2018) -
Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Enomoto, Masashi; Nafus, Kathleen; Demand, Marc; Foubert, Philippe (2017)