Browsing by author "Pomarede, C."
Now showing items 1-4 of 4
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Electrical properties and reliability of ultrathin remote plasma enhanced CVD Si3N4 layers
Houssa, Michel; Degraeve, Robin; Pomarede, C.; van Dijk, Kitty; Werkhoven, Chris; Mertens, Paul; Heyns, Marc; Stesmans, Andre (1999) -
Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS
Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Houssa, Michel; Heyns, Marc; Pomarede, C.; Werkhoven, Chris (2000) -
Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMS
Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Houssa, Michel; Heyns, Marc; Pomarede, C.; Werkhoven, Chris (1999) -
Single wafer CVD of silicon nitride for CMOS gate applications
Pomarede, C.; Werkhoven, Chris; Weidmann, J.; Bergman, T.; Gschwandtner, A.; Houssa, Michel (1999)