Browsing by author "Maslow, M."
Now showing items 1-3 of 3
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Extending EUV lithography for DRAM applications
Rispens, Gijsbert; Van Lare, C.; Oorschot, D.; Hoefnagels, R.; Liu, S.; Van Mierlo, W.; Zuurbier, N.; Dardani, Z.; Wang, Z.; Maslow, M.; Finders, J.; Fallica, Roberto; Frommhold, Andreas; Hendrickx, Eric; Niroomand, A.; Light, S. (2020) -
SPM characterizaton of anomalies in phase shift mask and their effect on wafer features
Muckenhirn, S.; Meyyappan, A.; Walch, K.; Maslow, M.; Vandenberghe, Geert; van Wingerden, Johannes (2001) -
Tone reversal patterning for advanced technology nodes
Schleicher, Filip; Bekaert, Joost; Thiam, Arame; Decoster, Stefan; Blanc, Romuald; Lazzarino, Frederic; Santaclara, J. Garcia; Rispens, G.; Maslow, M. (2022)