Browsing by author "Snee, Peter"
Now showing items 1-6 of 6
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A novel resist and post-etch residue removal process using ozonated chemistries
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Meuris, Marc; Heyns, Marc (1999) -
Cost-effective cleaning for advanced Si-processing
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Knotter, D. M.; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Snee, Peter; Teerlinck, Ivo; Vos, Rita (1998) -
Development of a reduced cleaning process for application in a spray processor
Snee, Peter; Mouche, Laurent; Mertens, Paul; Meuris, Marc; Schmidt, Harald; Heyns, Marc (1996) -
Effect of Fe contamination on quality of poly silicon gate structures
Mertens, Paul; De Gendt, Stefan; Depas, Michel; Kenis, Karine; Opdebeeck, Ann; Snee, Peter; Gräf, D.; Brown, G.; Heyns, Marc (1996)