Browsing by author "Houchens, Kevin"

Now showing items 1-4 of 4

    • e-beam metrology of thin resist for high NA EUVL 

      Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023)

    • Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle 

      Keshet, Mor; Gershon, Dor; Malul, Uriel; Blinder, Yaniv; Orr, Yonatan; Tam, Aviram; Santoro, Gaetano; Houchens, Kevin; Gallagher, Emily; Timmermans, Marina; Frommhold, Andreas; Lorusso, Gian (2021)

    • Metrology of Thin Resist for High NA EUVL 

      Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022)

    • Recess metrology challenges for 3D device architectures in advanced technology nodes 

      Santoro, Gaetano; Houchens, Kevin; Bogdanowicz, Janusz; Elizov, Moshe; Yaron, Lior; Chemama, Michael; Goldenshtein, Alex; Zakay, Amit; Amit, Noam; Briggs, Basoene; Pacco, Antoine; Delhougne, Romain; Cockburn, Andrew; Abramovitz, Yaniv; Tam, Aviram; Adan, Ofer; Mertens, Hans; Charley, Anne-Laure; Horiguchi, Naoto; Leray, Philippe; Lorusso, Gian (2022)