Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle

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Authors
Keshet, Mor; Gershon, Dor; Malul, Uriel; Blinder, Yaniv; Orr, Yonatan; Tam, Aviram; Santoro, Gaetano; Houchens, Kevin; Gallagher, Emily; Timmermans, Marina; Frommhold, Andreas; Lorusso, Gian
DOI
10.1117/12.2584695
EISBN
978-1-5106-4052-8
ISBN
978-1-5106-4051-1
ISSN
0277-786X
Conference
Conference on Extreme Ultraviolet (EUV) Lithography XII
Journal
Proceedings of SPIE
Volume
11609
Title
Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle
Publication type
Proceedings paper
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