Publication:

Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2584695
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dc.contributor.authorKeshet, Mor
dc.contributor.authorGershon, Dor
dc.contributor.authorMalul, Uriel
dc.contributor.authorBlinder, Yaniv
dc.contributor.authorOrr, Yonatan
dc.contributor.authorTam, Aviram
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorHouchens, Kevin
dc.contributor.authorGallagher, Emily
dc.contributor.authorTimmermans, Marina
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorLorusso, Gian
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.date.accessioned2022-03-11T13:15:20Z
dc.date.available2022-03-11T13:15:20Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2584695
dc.identifier.eisbn978-1-5106-4052-8
dc.identifier.isbn978-1-5106-4051-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39410
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1160910
dc.source.conferenceConference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.source.volume11609
dc.title

Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle

dc.typeProceedings paper
dspace.entity.typePublication
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