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    • Lithographic performance of 193 nm single and bi-layer materials 

      Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. (1998)