Browsing by author "Ohtomi, Eisuke"
Now showing items 1-2 of 2
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Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Ohtomi, Eisuke; Philipsen, Vicky; Welling, Ulrich; Melvin III, Lawrence S.; Takahata, Yosuke; Tanaka, Yusuke; De Simone, Danilo (2023) -
Resist line edge roughness mitigation for high-NA EUVL
Ohtomi, Eisuke; Philipsen, Vicky; Severi, Joren; Welling, Ulrich; Tanaka, Yusuke; De Simone, Danilo (2022)