Browsing by author "Knotter, Martin"
Now showing items 1-8 of 8
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A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
Behaviour of metallic contaminants during MOS processing
Bearda, Twan; De Gendt, Stefan; Loewenstein, Lee; Knotter, Martin; Mertens, Paul; Heyns, Marc (1998) -
Behaviour of metallic contaminants during MOS processing
Bearda, Twan; De Gendt, Stefan; Loewenstein, Lee; Knotter, Martin; Mertens, Paul; Heyns, Marc (1999) -
Deposition of particles on patterned silicon wafers
Wali, Faisal; Knotter, Martin; Bearda, Twan; Mertens, Paul (2008) -
Impact of organic contamination on gate oxide integrity
De Gendt, Stefan; Knotter, Martin; Kenis, Karine; Depas, Michel; Meuris, Marc; Mertens, Paul; Heyns, Marc (1998) -
Quantitative modeling of H2O2 decomposition in SC1
Mertens, Paul; Baeyens, Martien; Moyaerts, Gert; Okorn-Schmidt, H. F.; Vos, Rita; De Waele, Rita; Hatcher, Z.; Hub, W.; De Gendt, Stefan; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
Ultra thin gate oxide technology and reliability
Heyns, Marc; Depas, Michel; Teerlinck, Ivo; Meuris, Marc; Mertens, Paul; Vanhellemont, Jan; Mouche, Laurent; Nigam, Tanya; Wilhelm, Rudi; Knotter, Martin; Wolke, K.; Crossley, A.; Sofield, C. J.; Gräf, D. (1996) -
Use of grazing emission XRF for silicon wafer surface contamination measurements
De Gendt, Stefan; Kenis, Karine; Mertens, Paul; Heyns, Marc; Claes, M.; Van Grieken, R. E.; Bailleul, A.; Knotter, Martin; De Bokx, P. K. (1996)