Browsing by author "Franklin, C."
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Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Lauerhaas, Jeff; Mertens, Paul; Fyen, Wim; Kenis, Karine; Meuris, Marc; Nicolosi, T.; Bran, M.; Fraser, B.; Franklin, C.; Wu, Y.; Heyns, Marc (2000)