Authors

Lauerhaas, Jeff; Mertens, Paul; Fyen, Wim; Kenis, Karine; Meuris, Marc; Nicolosi, T.; Bran, M.; Fraser, B.; Franklin, C.; Wu, Y.; Heyns, Marc

Conference

Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM

Title

Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry

Publication type

Proceedings paper

Embargo date

9999-12-31